Mechanical Behavior of Microelectromechanical Microshutters
- Author
- Jones, Justin Scott
- Published
- August 17, 2014.
- Physical Description
- 1 electronic document
- Additional Creators
- Burns, Devin Edward and Li, Mary J.
Online Version
- hdl.handle.net , Connect to this object online.
- Restrictions on Access
- Unclassified, Unlimited, Publicly available.
Free-to-read Unrestricted online access - Summary
- A custom micro-mechanical test system was constructed using off-the-shelf components to characterize the mechanical properties of microshutters. Microshutters are rectangular microelectromechanical apertures which open and close about a narrow torsion bar hinge. Displacement measurements were verified using both capacitive and digital image correlation techniques. Repeatable experiments on Si3N4 cantilever beams verified that the test system operates consistently. Using beam theory, the modulus of elasticity of the low stress Si3N4 was approximately 150 GPa, though significant uncertainty exists for this measurement due primarily to imprecise knowledge of the cantilever thickness. Tests conducted on microshutter arrays concluded that reducing the Si3N4 thickness from 250 nm to 500 nm reduces the torsional stiffness by a factor of approximately four. This is in good agreement with analytical and finite element models of the microshutters.
- Other Subject(s)
- Collection
- NASA Technical Reports Server (NTRS) Collection.
- Note
- Document ID: 20140017469.
GSFC-E-DAA-TN16367.
SPIE Optics and Photonics 2014 - NanoScience and Engineering; 17-21 Aug. 2014; San Diego, CA; United States. - Terms of Use and Reproduction
- Copyright, Distribution as joint owner in the copyright.
View MARC record | catkey: 17532836