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Fine line lithography / edited by Roger Newman
Published
Amsterdam ; New York : North-Holland Pub. Co., 1980.
New York : Sole distributor for the USA and Canada, Elsevier North-Holland
Physical Description
1 online resource (vii, 481 pages).
Additional Creators
Newman, Roger
Access Online
ezaccess.libraries.psu.edu
Full Text available online
Availability
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Series
Materials processing, theory and practices ; v. 1.
Subject(s)
Integrated circuits
—
Large scale integration
Lithography
TECHNOLOGY & ENGINEERING
—
Electronics
—
Digital
TECHNOLOGY & ENGINEERING
—
Electronics
—
Microelectronics
Lithographie par faisceau d'électrons
Lithographie par rayons X.
Circuits intégrés à grande échelle
Integrierte Schaltung
Photolithographie (Halbleitertechnologie)
ISBN
9780444853516 (electronic bk.)
0444853510 (electronic bk.)
9780444601285 (electronic bk.)
0444601287 (electronic bk.)
1299537200 (ebk)
9781299537200 (ebk)
Bibliography Note
Includes bibliographical references and index.
View MARC record
| catkey: 18157197