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Actions for Patterning of material layers in submicron region
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Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle
Author
Tandon, U. S., 1952-
Published
New York : J. Wiley, 1993.
Physical Description
xii, 183 pages : illustrations (some color) ; 25 cm
Additional Creators
Khokle, W. S.
Full Text available online
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Subject(s)
Integrated circuits
—
Masks
Ion beam lithograph
Lithography, Electron beam
X-ray lithography
ISBN
0470220635 (J. Wiley)
8122405614 (Wiley Eastern)
Bibliography Note
Includes bibliographical references and index.
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| catkey: 1857724