Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
- Additional Titles:
- Integrated circuit metrology, inspection, and process control
- Bellingham, Wash. : SPIE, 
- Copyright Date:
- Physical Description:
- x, 636 pages : illustrations ; 28 cm.
- Additional Creators:
- Jones, Susan K.
Society of Photo-optical Instrumentation Engineers
Semiconductor Equipment and Materials International
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 3050
- Previous volumes entitled: Integrated circuit metrology, inspection and process control.
- Bibliography Note:
- Includes bibliographic references and author index.
View MARC record | catkey: 1937766