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Spacer engineered FinFET architectures : high-performance digital circuit applicators / Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal

Author
Dasgupta, Sudeb
Published
Boca Raton : Taylor & Francis, CRC Press, 2017.
Physical Description
1 online resource
Additional Creators
Kaushik, Brajesh Kumar and Pal, Pankaj Kumar
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Contents
Introduction to nanoelectronics -- Tri-gate FinFET technology and its advancement -- Dual-K spacer device architectures and its electrostatics -- Capacitive analysis & dual-K FinFET based digital circuit design -- Design metric improvement of dual-K based SRAM cell -- Statistical variability & sensitivity analysis.
Subject(s)
ISBN
9781351751049 (electronic bk.)
1351751042 (electronic bk.)
9781315191089 (electronic)
Bibliography Note
Includes bibliographical references.
Source of Acquisition
Purchased with funds from the J. Harvey Fahnestock Endowment for Scientific, Engineering and Rare Books; 2017
Endowment Note
J. Harvey Fahnestock Endowment for Scientific, Engineering and Rare Books
View MARC record | catkey: 21834115