Actions for Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.
Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A. / editors, G.S. Oehrlein [and others].
- Published
- Warrendale, Pa. : Materials Research Society, [2001]
- Copyright Date
- ©2001
- Physical Description
- 1 volume (various pagings) : illustrations ; 24 cm.
View MARC record | catkey: 2198176