Actions for Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA

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Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA / Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH

Published
Bellingham, Washington : SPIE, [2001]
Copyright Date
©2001
Physical Description
xxv, 876 pages : illustrations ; 28 cm.
Additional Creators
Sullivan, Neal T., Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, and International SEMATECH

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