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Femtosecond laser ablation-based mass spectrometry. An ideal tool for stoichiometric analysis of thin films [electronic resource].

Published:
Washington, D.C. : United States. National Nuclear Security Administration, 2015.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Physical Description:
Article numbers 13,121 : digital, PDF file
Additional Creators:
Pacific Northwest National Laboratory (U.S.), United States. National Nuclear Security Administration, United States. Department of Energy, National Science Foundation (U.S.), and United States. Department of Energy. Office of Scientific and Technical Information
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Summary:
An accurate and routinely available method for stoichiometric analysis of thin films is a desideratum of modern materials science where a material’s properties depend sensitively on elemental composition. We thoroughly investigated femtosecond laser ablation-inductively coupled plasma-mass spectrometry (fs-LA-ICP-MS) as an analytical technique for determination of the stoichiometry of thin films down to the nanometer scale. The use of femtosecond laser ablation allows for precise removal of material with high spatial and depth resolution that can be coupled to an ICP-MS to obtain elemental and isotopic information. We used molecular beam epitaxy-grown thin films of LaPd(x)Sb2 and T´-La2CuO4 to demonstrate the capacity of fs-LA-ICP-MS for stoichiometric analysis and the spatial and depth resolution of the technique. Here we demonstrate that the stoichiometric information of thin films with a thickness of ~10 nm or lower can be determined. Furthermore, our results indicate that fs-LA-ICP-MS provides precise information on the thin film-substrate interface and is able to detect the interdiffusion of cations.
Report Numbers:
E 1.99:pnnl-sa--107263
pnnl-sa--107263
Subject(s):
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Note:
Published through SciTech Connect.
08/19/2015.
"pnnl-sa--107263"
"srep13121"
Scientific Reports 5 ISSN 2045-2322 AM
LaHaye, Nicole; Kurian, Jose; Diwakar, Prasoon; Alff, Lambert; Harilal, Sivanandan.
Funding Information:
AC05-76RL01830
View MARC record | catkey: 23758755