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Effects of annealing temperature on morphology and thickness of samarium electrodeposited thin films [electronic resource].

Published
Washington, D.C. : United States. Office of the Assistant Secretary for Nuclear Energy, 2016.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Physical Description
pages 95-101 : digital, PDF file
Additional Creators
Oak Ridge National Laboratory, United States. Office of the Assistant Secretary for Nuclear Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
Electroplated depositions of Sm were prepared using a vertical well-type electrodeposition unit with an aqueous ammonium acetate electrolyte system, with an average deposition yield just over 87%. The depositions were analyzed for morphology and thickness by scanning electron microscopy (SEM) and chemical composition by energy dispersion X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) before and after firing. The depositions were fired at 125–700 °C, while varying the heating rate from 0.5 to 10 °C/min in either an oxidizing or reducing atmosphere. A heating rate of 10 °C/min was slow enough to prevent disruption of the deposition morphology during firing. Furthermore, a gas sweep enhanced the removal of any organic substituents, with an oxidizing environment being more advantageous than a reducing environment.
Report Numbers
E 1.99:1255664
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Note
Published through SciTech Connect.
05/17/2016.
"ST5001030"
"NEST001"
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment 830 C ISSN 0168-9002 AM
Nathan J. Sims; Daniel W. Stracener; Rose Ann Boll; Jonathan D. Burns; Kristian G. Myhre.
Funding Information
AC05-00OR22725
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