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Mask alignment system for semiconductor processing [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2017.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Additional Creators
United States. Department of Energy. Office of Management, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
Report Numbers
E 1.99:9,570,309
9,570,309
Subject(s)
Note
Published through SciTech Connect.
02/14/2017.
"9,570,309"
"14/101,974"
Aaron P. Webb; Charles T. Carlson; William T. Weaver; Christopher N. Grant.
Funding Information
EE0004737
View MARC record | catkey: 23766369