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Method and apparatus for improved high power impulse magnetron sputtering [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2013.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Additional Creators
Lawrence Berkeley National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.
Report Numbers
E 1.99:8,574,410
8,574,410
Subject(s)
Note
Published through SciTech Connect.
11/05/2013.
"8,574,410"
"12/989,378"
Anders, Andre.
Funding Information
AC02-05CH11231
View MARC record | catkey: 23767600