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Method & apparatus for monitoring plasma processing operations [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2004.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Additional Creators
Sandia National Laboratories, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.
Report Numbers
E 1.99:6,805,810
6,805,810
Subject(s)
Note
Published through SciTech Connect.
10/19/2004.
"6,805,810"
"10/108,193"
Smith, Jr., Michael; Ward, Pamela; Stevenson, Joel.
Funding Information
AC04-94AL85000
View MARC record | catkey: 23769373