22nd Annual BACUS Symposium on Photomask Technology : 1-4 October, 2002, Monterey, California, USA / Brian J. Grenon, Kurt R. Kimmel, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
- Conference Author:
- Symposium on Photomask Technology (22nd : 2002 : Monterey, Calif.)
- Additional Titles:
- BACUS Symposium on Photomask Technology
Symposium on Photomask Technology and Management
- Bellingham, Wash. : SPIE, 
- Copyright Date:
- Physical Description:
- 2 volumes : illustrations ; 28 cm.
- Additional Creators:
- Grenon, Brian J.
Kimmel, Kurt R.
BACUS (Technical group)
Society of Photo-optical Instrumentation Engineers
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