Nanocrystal thin film fabrication methods and apparatus [electronic resource].
- Published
- Washington, D.C. : United States. Dept. of Energy. Office of Basic Energy Sciences, 2018.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy - Additional Creators
- University of Pennsylvania, United States. Department of Energy. Office of Basic Energy Sciences, and United States. Department of Energy. Office of Scientific and Technical Information
Access Online
- Restrictions on Access
- Free-to-read Unrestricted online access
- Summary
- Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.
- Report Numbers
- E 1.99:9,865,465
9,865,465 - Subject(s)
- Note
- Published through SciTech Connect.
01/09/2018.
"9,865,465"
"14/761,799"
Cherie R. Kagan; David K. Kim; Ji-Hyuk Choi; Yuming Lai. - Funding Information
- SC0002158
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