The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO<sub>2</sub>/SiO<sub>2</sub> thin-film pairs [electronic resource].
- Published
- Washington, D.C. : United States. Dept. of Energy, 2015.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy - Physical Description
- Article numbers 96,320B : digital, PDF file
- Additional Creators
- United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information
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- Summary
- The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered and electron-beam–evaporated coatings comprised from HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage-threshold measurements were performed for a one-wave (355-nm wavelength) thick, HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers, equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thin-film interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film in both sputtered and evaporated coatings. Here, the results are explained through the similarity of interfacial film structure with structure formed during the co-deposition of HfO2 and SiO2 materials.
- Report Numbers
- E 1.99:1264157
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- Other Subject(s)
- Note
- Published through SciTech Connect.
11/23/2015.
"2015-213 TIC-1288"
Proceedings of SPIE - The International Society for Optical Engineering 9632 0277-786X AM
Laser-Induced damage in optical materials, Boulder, CO (United States), 27 Sep 2015.
Detlev Ristau; S. Papernov; A. A. Kozlov; J. B. Oliver; C. Smith; L. Jensen; S. Gunster; H. Madebach.
Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics - Funding Information
- NA0001944
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