The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO<sub>2</sub>/SiO<sub>2</sub> thin-film pairs [electronic resource].
- Washington, D.C. : United States. Dept. of Energy, 2015. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
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- Article numbers 96,320B : digital, PDF file
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- United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information
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- Free-to-read Unrestricted online access
- The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered and electron-beam–evaporated coatings comprised from HfO<sub>2</sub> and SiO<sub>2</sub> thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage-threshold measurements were performed for a one-wave (355-nm wavelength) thick, HfO<sub>2</sub> single-layer film and for a film containing seven narrow HfO<sub>2</sub> layers separated by SiO<sub>2</sub> layers. The seven-layer film was designed to have a total optical thickness of HfO<sub>2</sub> layers, equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO<sub>2</sub> film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thin-film interfaces, as compared to HfO<sub>2</sub> film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO<sub>2</sub> film in both sputtered and evaporated coatings. Here, the results are explained through the similarity of interfacial film structure with structure formed during the co-deposition of HfO<sub>2</sub> and SiO<sub>2</sub> materials.
- Published through SciTech Connect., 11/23/2015., "2015-213 TIC-1288", Proceedings of SPIE - The International Society for Optical Engineering 9632 0277-786X AM, Laser-Induced damage in optical materials, Boulder, CO (United States), 27 Sep 2015., Detlev Ristau; S. Papernov; A. A. Kozlov; J. B. Oliver; C. Smith; L. Jensen; S. Gunster; H. Madebach., and Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics
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