Actions for Method of fabricating a high aspect ratio microstructure [electronic resource].

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Method of fabricating a high aspect ratio microstructure [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2003.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy
Additional Creators
Brookhaven National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.
Report Numbers
E 1.99:6,558,868
6,558,868
Subject(s)
Note
Published through SciTech Connect.
05/06/2003.
"6,558,868"
"09/785,053"
Warren, John.
Funding Information
AC02-98CH10886
View MARC record | catkey: 24505299