Metrology, inspection, and process control for microlithography XVIII : 23-26 February, 2004, Santa Clara, California, USA / Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
- Bellingham, Wash. : SPIE, 
- Copyright Date:
- Physical Description:
- 2 volumes : illustrations ; 28 cm.
- Additional Creators:
- Silver, Richard M.
Society of Photo-optical Instrumentation Engineers
Semiconductor Equipment and Materials International
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