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Summary:
This report covers the current status of techniques for evaluation of s semiconductor epitaxial-layer thickness and resistivity. These techniques are summarized from the activity of the Task Force on Epitaxial Materials of Subcommittee VI on Semiconductors, of ASTM Committee F-1 on Materials for Electron Tubes and Semiconductor Devices.
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Reproduction Note:
Electronic reproduction. W. Conshohocken, Pa. : ASTM International, 1963. Mode of access: World Wide Web. System requirements: Web browser. Access may be restricted to users at subscribing institutions.
