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A lithographer's guide to patterning CMOS devices with directed self-assembly / by Douglas J. Guerrero

Author
Guerrero, Douglas J., 1964-
Published
Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2020.
Physical Description
1 online resource (v, 30 pages).
Additional Creators
Society of Photo-Optical Instrumentation Engineers
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Restrictions on Access
Restricted to subscribers or individual electronic text purchasers.
Contents
Preface -- 1. Introduction -- 2. Directed self-assembly and block copolymers -- 3. Process flows: 3.1. Graphoepitaxial flows; 3.2. Chemical-epitaxial flows -- 4. Combining grapho- and chemoepitaxial flows -- 5. Combining DSA with EUV lithography -- 6. Material modification for pattern transfer -- 7. Applications for device fabrication -- 8. Defectivity -- 9. Metrology -- 10. Summary -- References.
Summary
This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed.
Subject(s)
Genre(s)
ISBN
9781510637016 pdf
Related Titles
SPIE digital library
Note
"SPIE Digital Library."--Website.
Bibliography Note
Includes bibliographical references.
Technical Details
Mode of access: World Wide Web.
System requirements: Adobe Acrobat Reader.
View MARC record | catkey: 31197542