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VLSI Technology [electronic resource] : Fundamentals and Applications / edited by Yasuo Tarui

Published
Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 1986.
Edition
1st ed. 1986.
Physical Description
XIV, 450 pages : online resource
Additional Creators
Tarui, Yasuo and SpringerLink (Online service)
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Contents
1. lntroduction -- 1.1 The Significance of Semiconductor Integrated Circuits -- 1.2 Prospects of High-Density Integration -- 1.3 Device Dimensions and Density of Integration -- 1.4 Outline of the Microfabrication Technology -- 2. Electron Beam Lithography -- 2.1 Background -- 2.2 Components for Electron-Beam Lithography -- 2.3 Software for Electron-Beam Lithography -- 2.4 Wafer and Writing Systems -- 3. Pattern Replication Technology -- 3.1 UV Replication Technologies -- 3.2 Deep-UV Projection System -- 3.3 X-Ray Lithography -- 3.4 Electron-Beam Projection -- 3.5 Radiation-Sensitive Resist for Microfabrication -- 4. Mask Inspection Technology -- 4.1 Principles of Mask Inspection -- 4.2 Mask Inspection Systems -- 5. Crystal Technology -- 5.1 Overview -- 5.2 Impurities in Si Crystals -- 5.3 Wafer Bow and Warpage -- 5.4 Thermally Induced Microdefects -- 5.5 Epitaxial Growth -- 6. Process Technology -- 6.1 Dry Etching -- 6.2 Beam Annealing -- 6.3 Thin-Film Deposition Techniques -- 6.4 Metallization -- 6.5 Evaluation of Gate Oxide Film -- 6.6 Super Clean Environment -- 7. Fundamentals of Test and Evaluation -- 7.1 Testing and Evaluation of the Device Design -- 7.2 Device Analysis and Evaluation -- 7.3 Device Testing -- 8. Basic Device Technology -- 8.1 Background -- 8.2 Limitations for Miniaturization -- 8.3 Prediction of Device Performance Advancements -- 8.4 Examples of Device Structure -- 8.5 Device Structure -- References.
Subject(s)
ISBN
9783642691928
Digital File Characteristics
PDF
text file
Part Of
Springer Nature eBook
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