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Extreme ultraviolet lithography / edited by Banqiu Wu, Ajay Kumar

Published
New York, N.Y. : McGraw-Hill Education, [2009]
Copyright Date
?2009
Edition
First edition.
Physical Description
1 online resource (xiv, 465 pages) : illustrations
Additional Creators
Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., and Kamberian, Henry
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Series
Language Note
In English.
Contents
Exposure system -- EUV sources -- EUV optics -- Multilayer interference coatings for EUVL -- EUV photoresist -- EUVL masks.
Summary
"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.".
Subject(s)
Genre(s)
ISBN
0071664793
9780071549189
0071549188 (print-ISBN)
Related Titles
Exposure system
EUV sources
EUV optics
Multilayer interference coatings for EUVL
EUV metrology
EUV photoresist
EUVL masks
Note
Print version c2009.
Bibliography Note
Includes bibliographical references and index.
Other Forms
Also available in print edition.
Reproduction Note
Electronic reproduction. New York, N.Y. : McGraw Hill, 2009. Mode of access: World Wide Web. System requirements: Web browser. Access may be restricted to users at subscribing institutions.
Technical Details
Mode of access: Internet via World Wide Web.
View MARC record | catkey: 37106971