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Nanoscale CMOS VLSI circuits : design for manufacturability / Sandip Kundu, Aswin Sreedhar

Author
Kundu, Sandip
Additional Titles
Nanoscale complementary metal oxide semiconductor very large-scale integration circuits
Published
New York, N.Y. : McGraw-Hill Education, [2011]
Copyright Date
?2011
Edition
First edition.
Physical Description
1 online resource (xv, 296 pages) : illustrations
Additional Creators
Sreedhar, Aswin, Penn, Michael, Fogarty, David E., Darnell, Matt, and Kundu, Sandip
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Series
Language Note
In English.
Contents
Semiconductor manufacturing -- Process and device variability : analysis and modeling -- Manufacturing-aware physical design closure -- Metrology, manufacturing defects, and defect extraction -- Defect impact modeling and yield improvement techniques -- Physical design and reliability -- Design for manufacturability : tools and methodologies.
Summary
Covering the latest devices; technologies; and processes; this detailed guide offers proven methods for optimizing circuit designs to increase the yield; reliability; and manufacturability of products and mitigate defects and failure.
Subject(s)
Genre(s)
ISBN
007177632X
9780071635196
007163519X (print-ISBN)
Related Titles
Semiconductor manufacturing
Process and device variability: analysis and modeling
Manufacturing-aware physical design closure
Metrology, manufacturing defects, and defect extraction
Defect impact modeling and yield improvement techniques
Physical design and reliability
Design for manufacturability: tools and methodologies
Note
Print version c2010.
Bibliography Note
Includes bibliographical references and index.
Other Forms
Also available in print edition.
Reproduction Note
Electronic reproduction. New York, N.Y. : McGraw Hill, 2011. Mode of access: World Wide Web. System requirements: Web browser. Access may be restricted to users at subscribing institutions.
Technical Details
Mode of access: Internet via World Wide Web.
View MARC record | catkey: 37107050