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ISTFA 2003 : proceedings of the 29th International Symposium for Testing and Failure Analysis, 2-6 November 2003, Santa Clara Convention Center, Santa Clara, California / sponsored by EDFAS

Conference Author
International Symposium for Testing and Failure Analysis (29th : 2003 : Santa Clara, Calif.)
Additional Titles
Proceedings of the 29th International Symposium for Testing and Failure Analysis, 2-6 November 2003 and Conference proceedings from the 29th International Symposium for Testing and Failure Analysis
Published
Materials Park, Ohio : ASM International, 2003.
Physical Description
1 online resource (518 pages) : illustrations
Additional Creators
ASM International and Electronic Device Failure Analysis Society
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Contents
ISTFA 2003 Organizing Committee -- EDFAS 2003 â€? 2004 Board Of Directors -- ISTFA 2003 Subcommittee Members -- Preface -- Table of Contents -- Session 1: Advanced Techniques -- Scanning magnetoresistive microscopy for die-level sub-micron current density mapping -- High Resolution Current Imaging by Direct Magnetic Field Sensing -- Fault Isolation of High Resistance Defects using Comparative Magnetic Field Imaging -- High Resolution Backside Thermography using a Numerical Aperture Increasing Lens -- Session 2: Optical Techniques, Study of Critical Factors Determining Latchup Sensitivity of ICs using Emission MicroscopyNew Applications of Thermal Laser Signal Injection Microscopy (T-LSIM) -- PC Card Based Optical Probing of Advanced Graphics Processor using Time Resolved Emission -- Time-Resolved Optical Measurements from 0.13Âæm CMOS Technology Microprocessor using a Superconducting Single- Photon Detector -- IC Diagnostic with Time Resolved Photon Emission and CAD Auto-channeling -- Session 3: Package Level Analysis 1 -- 3D X-ray Computed Tomography (CT) for Electronic Packages, High- Angle Electron Microscopy Technique for Analysis of Thin Film Contamination on IC Package ExteriorsSolder bump defects in ceramic flip chip packages and their acoustic signatures. -- Copper Bond over Active Circuit (BOAC) and Copper over Anything (COA) Failure Analysis -- Investigation of Bond-pad Related Inter-metal Dielectric Crack -- Session 4: Sample Preparation 1 -- Enhanced SEM Doping Contrast -- Interconnect and Gate Level Delayering Techniques for Cu/ Low k Technology Failure Analysis, Backside Deprocessing of CMOS SOI Devices for Physical Defect and Failure AnalysisA Novel Approach to Front-side Deprocessing for Thinned Die after Backside Failure Isolation -- Session 5: System Level Analysis -- Dynamic Infrared System Level Fault Isolation -- X-ray Laminography Benchmarking and Failure Analysis of Solder Joint Interfaces -- XRF Correlation of Board Reseats due to Intermittent Failures from the use of Thin Gold Plating finish on the Contact Fingers -- Session 6: Metrology and Materials Analysis 1, and Real Time SEM Imaging of FIB Milling Processes for Extended Accuracy on TEM Samples for EFTEM AnalysisA Method for Exact Determination of DRAM Deep Trench Surface Area -- A Review of TEM Observations of Failures of the Memory Cell in a Deep Trench Capacitor DRAM -- The Effect of TEM Specimen Preparation Method on Ultra-thin Gate Dielectric Analysis -- Forward Scattered Scanning Electron Microscopy for Semiconductor Metrology and Failure Analysis -- Session 7: Failure Analysis Process -- Contributions of a Formal Analysis Metaprocess to Breakthrough Failure Analysis Results
Subject(s)
Genre(s)
ISBN
9781615030866 (electronic bk.)
1615030867 (electronic bk.)
9780871707888
0871707888
Bibliography Note
Includes bibliographical references and index.
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