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Characterization in silicon processing / editor, Yale Strausser ; series editors, C. Richard Brundle and Charles A. Evans

Additional Titles
Silicon processing
Published
New York, NY : Momentum Press, 2010.
Physical Description
1 online resource (xv, 240 pages) : illustrations
Additional Creators
Strausser, Yale, Brundle, C. R., and Evans, Charles A.
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Series
Contents
Application of materials characterization techniques to silicon epitaxial growth / C.I. Drowley -- Polysilicon conductors / Yale Strausser -- Silicides / S.P. Murarka -- Aluminum- and copper-based conductors / David Fanger and Roger Tonneman -- Tungsten-based conductors / Roc Blumenthal and Gregory C. Smith -- Barrier films / M. Lawrence A. Dass.
Summary
With a focus on the use of materials characterization techniques for silicon-based semiconductors, this volume in the Materials Characterization series focuses on the process flow of silicon wafer manufacture where materials properties, processing and associated problems are brought to the fore. The book is organized by the types of materials commonly associated with integrated silicon semiconductor circuits and the typical processes involved for each such material, including deposition, thermal treatment, and lithography. Readers will find features such as: -- The essential processes of Silic.
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ISBN
9781606501115 (electronic bk.)
1606501119 (electronic bk.)
9781606501092
1606501097
1606501119
Note
"First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--Title page verso.
Bibliography Note
Includes bibliographical references and index.
View MARC record | catkey: 43228986