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Comparative study of blistering in Nb, V, and V--20 % Ti.
Author
Das, S. K.
Published
[Place of publication not identified] : [publisher not identified], 1972.
[Oak Ridge, Tennessee] : [U.S. Atomic Energy Commission], 1972.
Physical Description
microfiche : negative ; 11 x 15 cm
Additional Creators
Kaminsky, M.
Full Text available online
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Report Numbers
CONF-721111-20
Other Subject(s)
Collisions
Helium ions
Helium ions/implantation in nb, v, and v-20 percent ti at 0.5 mev, blistering in.
Irradiation
Kev range 100-1000
N50240 -metals, ceramics, & other materials-metals & alloys-radiation effects
N70800 -physics-controlled thermonuclear research-thermonuclear engineering & equipment
Niobium/helium-ion implantation at 0.5 mev, blistering in.
Sputtering
Titanium alloys and systems/ti-v, helium-ion implantation at 0.5 mev, blistering in.
Titanium alloys- vanadium alloys
Vanadium alloys and systems/ti-v, helium-ion implantation at 0.5 mev, blistering in.
Vanadium
Vanadium/helium-ion implantation at 0.5 mev, blistering in.
Voids niobium
Collection
U.S. Atomic Energy Commission depository collection.
Note
NSA number: NSA-27-020382
OSTI Identifier 4594592
Research organization: ARGONNE NATIONAL LAB., ILL.
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