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Actions for About the mechanism of sputtering with light ions in the keV-energy region
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About the mechanism of sputtering with light ions in the keV-energy region
Author
Behrisch, R
Published
Germany : [publisher not identified], 1973.
[Oak Ridge, Tennessee] : [U.S. Atomic Energy Commission], 1973.
Physical Description
microfiche : negative ; 11 x 15 cm
Additional Creators
Sigmund, P.
and
Weissmann, R.
Full Text available online
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Report Numbers
IPP-9/13
Other Subject(s)
Copper- sputtering
Hydrogen ions 1 plus- collisions
Backscattering
Beryllium
Films
Kev range 10-100
N60100 -physics (atomic & molecular)-atomic, electron, ion & molecular beams & reactions
Niobium
Protons
Substrates
Tantalum
Vanadium
Collection
U.S. Atomic Energy Commission depository collection.
Note
NSA number: NSA-28-031010
OSTI Identifier 4422736
Research organization: Max-Planck-Institut fuer Plasmaphysik, Garching/Munich (F.R. Germany).
View MARC record
| catkey: 45376006