Email RIS file
Bookmark
Report an Issue

20th Annual BACUS Symposium on Photomask Technology [electronic resource] : 13-15 September, 2000, Monterey, [California] USA / Brian J. Grenon, Giang T. Dao, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

Conference Author:
Symposium on Photomask Technology (20th : 2000 : Monterey, Calif.)
Additional Titles:
BACUS Symposium on Photomask Technology, Symposium on Photomask Technology and Management, and Photomask technology
Published:
Bellingham, Wash. : SPIE, [2001]
Copyright Date:
©2001
Physical Description:
xv, 938 pages : illustrations (some color) ; 28 cm.
Additional Creators:
Grenon, Brian J., Dao, Giang T., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, and SPIE Digital Library
Access Online

Availability

I Want It
I Want It

Finding items...

Series:
Subject(s):
Note:
AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
Bibliography Note:
Includes bibliographical references and author index.
Other Forms:
Also available in print.
Reproduction Note:
Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
View MARC record | catkey: 4576614