20th Annual BACUS Symposium on Photomask Technology [electronic resource] : 13-15 September, 2000, Monterey, [California] USA / Brian J. Grenon, Giang T. Dao, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
- Conference Author:
- Symposium on Photomask Technology (20th : 2000 : Monterey, Calif.)
- Additional Titles:
- BACUS Symposium on Photomask Technology, Symposium on Photomask Technology and Management, and Photomask technology
- Bellingham, Wash. : SPIE, 
- Copyright Date:
- Physical Description:
- xv, 938 pages : illustrations (some color) ; 28 cm.
- Additional Creators:
- Grenon, Brian J., Dao, Giang T., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, and SPIE Digital Library
- AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
- Bibliography Note:
- Includes bibliographical references and author index.
- Other Forms:
- Also available in print.
- Reproduction Note:
- Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
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