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Advances in resist technology and processing XXI [electronic resource] : 23-24 February 2004, Santa Clara, California, USA / John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMITECH

Published
Bellingham, Wash. : SPIE, [2004]
Copyright Date
©2004
Physical Description
2 volumes : illustrations ; 28 cm.
Additional Creators
Sturtevant, John L., Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and SPIE Digital Library
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AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
Bibliography Note
Includes bibliographical references and author index.
Other Forms
Also available in print.
Reproduction Note
Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2004. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
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