Emerging lithographic technologies [electronic resource] : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH
- Published:
- Bellingham, Wash. : SPIE, [1997]
- Copyright Date:
- ©1997
- Physical Description:
- ix, 412 pages : illustrations ; 28 cm.
- Additional Creators:
- Seeger, David E., Society of Photo-optical Instrumentation Engineers, and SPIE Digital Library
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- Series:
- Subject(s):
- Note:
- AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
- Bibliography Note:
- Includes bibliographical references and index.
- Other Forms:
- Also issued in print.
- Reproduction Note:
- Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2004. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
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