Photomask and next-generation lithography mask technology XI [electronic resource] : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan [and others] ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering