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Advances in resist technology and processing XXII [electronic resource] : 28 February-2 March 2005, San Jose, California, USA / John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering

Published
Bellingham, Wash. : SPIE, [2005]
Copyright Date
©2005
Physical Description
2 volumes (xliii, 1,216 pages) : illustrations ; 28 cm.
Additional Creators
Sturtevant, John L., Society of Photo-optical Instrumentation Engineers, AZ Electronic Materials (Firm), Rohm and Haas Electronic Materials, International SEMATECH, and SPIE Digital Library
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AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
Bibliography Note
Includes bibliographical references and author index.
Other Forms
Also available in print.
Reproduction Note
Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2005. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
View MARC record | catkey: 4579684