Actions for Microstructure and properties of TiB

Email RIS file
Bookmark
Report an Issue

Microstructure and properties of TiB/sub 2/ implanted with 1-MeV nickel

Author
McHargue, C. J.
Published
United States : [publisher not identified], 1983
Springfield, Va.: National Technical Information Service, [approximately 1983]
Physical Description
microfiche : negative ; 11 x 15 cm
Additional Creators
Angelini, P., Lewis, M. B., and Sklad, P. S.

Availability

Browse Nearby on Shelf
I Want It
I Want It

Finding items...

Summary
Polycrystalline samples of TiB/sub 2/ were implanted at ambient temperatures with 1-MeV Ni/sup +/ ions to a fluence of 1 x 10/sup 17/ ions/cm/sup 2/. This fluence corresponds to a calculated nickel-to-titanium ratio, within the half width of the ion distribution, of approximately 0.12. Analytical electron microscopy was used to study the resultant microstructure. The starting microstructure was modified to a depth of approximately 750 nm, significantly deeper than the calculated peak in the deposited nickel profile of 389 nm. The results also show a change in the character of the microstructure, from one exhibiting a moderate density of tangled dislocations to a high density of small defects, as well as a change in the concentration of nickel as a function of depth from the implanted surface. There was no evidence of nickel precipitation. Surface mechanical properties such as hardness and wear resistance were significantly increased.
Report Numbers
DE83014020; CONF-830573-2
Other Subject(s)
Collection
NTIS collection.
Note
DOE contract number: W-7405-ENG-26
OSTI Identifier 6264562
Research organization: Oak Ridge National Lab., TN (USA).
View MARC record | catkey: 47332836