Actions for Research on high-efficiency, stacked, multijunction amorphous silicon alloy thin-film solar cells. Semiannual report, 11 October 1983-11 May 1984

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Research on high-efficiency, stacked, multijunction amorphous silicon alloy thin-film solar cells. Semiannual report, 11 October 1983-11 May 1984

Published
United States : [publisher not identified], 1985
Springfield, Va.: National Technical Information Service, [approximately 1985]
Physical Description
microfiche : negative ; 11 x 15 cm

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Summary
This report presents results of the first six months of research conducted to study amorphous silicon alloy materials and devices. A single-chamber plasma deposition reactor for a-Si growth was built and operated. The reactor features turbo-molecular pumping, separate gas manifolds for doped and undoped deposition, and three-electrode geometry. A design was completed for a six-section reactor that permits up to three p-i-n devices to be made in separate chambers. a-Si:H p-i-n devices with glass/SnO2/p+/i/n+/Al structures having 5%-6% efficiencies under outdoor illumination were made and studied. A model for multijunction cells was also developed that shows that 16% efficiencies are realizable provided that each component cell has an efficiency of at least 10%, among other parameters described in the report.
Report Numbers
DE85008808; SERI/STR-211-2636
Other Subject(s)
Collection
NTIS collection.
Note
DOE contract number: AC02-83CH10093
OSTI Identifier 5720863
Research organization: Spire Corp., Bedford, MA (USA).
View MARC record | catkey: 47351648