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Workshop on compact storage ring technology : applications to lithography

Published
United States : [publisher not identified], 1986
Springfield, Va.: National Technical Information Service, [approximately 1986]
Physical Description
microfiche : negative ; 11 x 15 cm

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Summary
Project planning in the area of x-ray lithography is discussed. Three technologies that are emphasized are the light source, the lithographic technology, and masking technology. The needs of the semiconductor industry in the lithography area during the next decade are discussed, particularly as regards large scale production of high density dynamic random access memory devices. Storage ring parameters and an overall exposure tool for x-ray lithography are addressed. Competition in this area of technology from Germany and Japan is discussed briefly. The design of a storage ring is considered, including lattice design, magnets, and beam injection systems. (LEW)
Report Numbers
DE87000993; BNL-52005; CONF-860393-Summs.
Other Subject(s)
Collection
NTIS collection.
Note
DOE contract number: AC02-76CH00016
OSTI Identifier 6863403
Research organization: Brookhaven National Lab., Upton, NY (USA).
View MARC record | catkey: 47370526