Actions for Polymers for microelectronics [electronic resource] : resists and dielectrics
Polymers for microelectronics [electronic resource] : resists and dielectrics / Larry F. Thompson, editor, C. Grant Willson, editor, Seiichi Tagawa, editor
- Published
- Washington, DC : American Chemical Society, 1994.
- Physical Description
- xii, 571 pages : illustrations ; 24 cm.
- Additional Creators
- Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Tagawa, Seiichi, American Chemical Society. Division of Polymeric Materials: Science and Engineering, and American Chemical Society. Meeting (203rd : 1992 : San Francisco, Calif.)
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- Contents
- Machine generated contents note: 1.Chemical Amplification Mechanisms for Microlithography / E. Reichmanis / F. M. Houlihan / O. Nalamasu / T. X. Neenan -- 2.Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification / F. M. Houlihan / E. Chin / O. Nalamasu / J. M. Kometani -- 3.Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols) / Ying Jiang / David R. Bassett -- 4.Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin / N. Takeyama / Y. Ueda / T. Kusumoto / H. Ueki / M. Hanabata -- 5.Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging / H. Ito / Y. Maekawa / R. Sooriyakumaran / E. A. Mash -- 6.An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography / Eiichi Kobayashi / Makoto Murata / Mikio Yamachika / Yasutaka Kobayashi / Yoshiji Yumoto / Takao Miura -- 7.A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films / W. D. Hinsberg / S. A. MacDonald / C. D. Snyder / H. Ito / R. D. Allen -- 8.Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene / C.-P. Lei / T. Long / S. K. Obendorf / F. Rodriguez -- 9.Synthesis and Polymerizations of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist / Kwang-Duk Ahn / Deok-Il Koo -- 10.Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists / Yoshiaki Inaki / Nobuo Matsumura / Kiichi Takemoto -- 11.Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists / R. D. Allen / G. M. Wallraff / W. D. Hinsberg / L. L. Simpson / R. R. Kunz -- 12.Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO[subscript 2] Formation by Chemical Vapor Deposition / Masamitsu Shirai / Masahiro Tsunooka -- 13.Polysilphenylenesiloxane Resist with Three-Dimensional Structure / K. Watanabe / E. Yano / T. Namiki / Y. Yoneda -- 14.Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films / J. M. Calvert / W. J. Dressick / C. S. Dulcey / M. S. Chen / J. H. Georger / D. A. Stenger / T. S. Koloski / G. S. Calabrese -- 15.Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists / V. Rao / W. D. Hinsberg / C. W. Frank / R. F. W. Pease -- 16.Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists / James R. Sheats -- 17.Advances in the Chemistry of Resists for Ionizing Radiation / Ralph Dammel -- 18.Out-of-Plane Expansion Measurements in Polyimide Films / Michael T. Pottiger / John C. Coburn -- 19.Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes / M. F. Welker / H. R. Allcock / G. L. Grune / R. T. Chern / V. T. Stannett -- 20.Synthesis of Perfluorinated Polyimides for Optical Applications / Shinji Ando / Tohru Matsuura / Shigekuni Sasaki -- 21.Charged Species in [sigma]-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices / K. Ushida / A. Kira / S. Tagawa / Y. Yoshida / H. Shibata -- 22.Acid-Sensitive Phenol-Formaldehyde Polymeric Resists / W. Brunsvold / W. Conley / W. Montgomery / W. Moreau -- 23.Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists / Sui Xiong Cai / M. N. Wybourne / John F. W. Keana -- 24.New Photoresponsive Polymers Bearing Norbornadiene Moiety: Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers / K. Kishi / C. Hijikata / A. Kameyama / T. Nishikubo -- 25.Photoinitiated Thermolysis of Poly(5-norbornene 2,3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists / Franz Stelzer / Ernst Zenkl / Michael Schimetta -- 26.Recent Progress of the Application of Polyimides to Microelectronics / Daisuke Makino -- 27.Base-Catalyzed Cyclization of ortho-Aromatic Amide Alkyl Esters: A Novel Approach to Chemical Imidization / W. Volksen / T. Pascal / J. W. Labadie / M. I. Sanchez -- 28.Base-Catalyzed Photosensitive Polyimide / J. W. Labadie / M. I. Sanchez / N. P. Hacker / W. Volksen / D. R. McKean / G. M. Wallraff -- 29.Novel Cross-Linking Reagents Based on 3,3-Dimethyl-1-phenylenetriazene / Aldrich N. K. Lau / Lanchi P. Vo -- 30.Preparation of Novel Photosensitive Polyimide Systems via Long-Lived Active Intermediates / Kazuyuki Horie / Takahi Yamashita -- 31.Photoregulation of Liquid-Crystalline Orientation by Anisotropic Photochromism of Surface Azobenzenes / Kunihiro Ichimura / Yuji Kawanishi / Takashi Tamaki -- 32.Factors Affecting the Stability of Polypyrrole Films at Higher Temperatures / B. C. Ennis / V.-T. Truong -- 33.Intrinsic and Thermal Stress in Polyimide Thin Films / D. P. Kirby / M. Ree -- 34.Fluorinated, Soluble Polyimides with High Glass-Transition Temperatures Based on a New, Rigid, Pentacyclic Dianhydride: 12,14-Diphenyl-12,14-bis(trifluoromethyl)-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic Dianhydride / Brian C. Auman / Swiatoslaw Trofimenko -- 35.Processable Fluorinated Acrylic Resins with Low Dielectric Constants / James R. Griffith / Henry S.-W. Hu -- 36.Enhanced Processing of Poly(tetrafluoroethylene) for Microelectronics Applications / Frank D. Egitto / Charles R. Davis -- 37.Fluorinated Poly(arylene ethers) with Low Dielectric Constants / Janusz B. Wojtowicz / Frank W. Mercer / Timothy D. Goodman / David W. Duff -- 38.Microstructural Characterization of Thin Polyimide Films by Positron Lifetime Spectroscopy / A. Eftekhari / D. M. Stoakley / A. K. St. Clair / J. J. Singh / Danny R. Sprinkle -- 39.Synthesis and Characterization of New Poly(arylene ether oxadiazoles) / Chris Coffin / David W. Duff / Frank W. Mercer.
- Subject(s)
- Genre(s)
- ISBN
- 0841227217 (alk. paper)
- Note
- "Developed from a symposium sponsored by the Division of Polymeri Materials: Science and Engineering, Inc., of the American Chemical Society and the Society of Polymer Science, Japan, at the 203rd National Meeting of the American Chemical Society, San Francisco, California, April 5-10, 1992."
- Bibliography Note
- Includes bibliographical references and indexes.
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