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Stress induced phenomena in metallization [electronic resource] : fourth international workshop, Tokyo, Japan, June, 1997 / editors, Hidekazu Okabayashi, Shoso Shingubara, Paul S. Ho.
Published:
Woodbury, N.Y. : American Institute of Physics, c1998.
Physical Description:
ix, 519 p. : ill. ; 25 cm.
Additional Creators:
Okabayashi, Hidekazu
,
Shingubara, Shoso
,
Ho, P. S.
, and
International Workshop on Stress-Induced Phenomena in Metallization (4th : 1997 : Tokyo, Japan)
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Series:
AIP conference proceedings ; no. 418
Restrictions on Access:
License restrictions may limit access.
Report Numbers:
DOE CONF-976190
Subject(s):
Integrated circuits
—
Defects
—
Congresses
Thin film devices
—
Defects
—
Congresses
Electrodiffusion
—
Congresses
Metallic films
—
Congresses
Electrochemical metallizing
—
Congresses
Aluminum films
—
Congresses
Semiconductors
—
Defects
—
Congresses
Liquid crystal devices
—
Defects
—
Congresses
Acoustic surface wave devices
—
Defects
—
Congresses
Genre(s):
Electronic books
ISBN:
1563966824
Note:
"DOE CONF-976190"--T.p. verso.
Bibliography Note:
Includes bibliographical references and index.
View MARC record
| catkey: 9242514